搜索结果: 1-11 共查到“工学 Mask”相关记录11条 . 查询时间(0.045 秒)
基于Mask R-CNN的枪弹底火装配质量检测系统设计
底火 装配质量检测 Mask RCNN 机器视觉
2020/8/17
提出了一种基于Mask R-CNN的枪弹底火装配质量检测方案。构建了底火装配质量在线检测系统，该系统利用机器视觉技术设计了基于Mask R-CNN网络模型的检测算法，主要借助目标检测算法 Faster R-CNN进行目标定位，用全卷积神经网络(FCN) 进行分割，实现枪弹底火装配缺陷位置显示和标记。通过实验将本文检测方法与人工检测方式进行了对比，结果表明，该方案能够快速、准确、有效地判别出合格品，...
TARGETS MASK U-NET FOR WIND TURBINES DETECTION IN REMOTE SENSING IMAGES
object detection VHRRSI wind turbines shadow wide-field detector U-Net
2018/5/14
To detect wind turbines precisely and quickly in very high resolution remote sensing images (VHRRSI) we propose target mask U-Net. This convolution neural network (CNN), which is carefully designed to...
A RAPID CLOUD MASK ALGORITHM FOR SUOMI NPP VIIRS IMAGERY EDRS
Suomi NPP VIIRS Cloud Mask Algorithm
2015/5/6
Suomi National Polar-orbiting Partnership (NPP) is the first of a new generation of NASA's Earth-observing research satellites. The Suomi NPP Visible Infrared Imaging Radiometer Suite (VIIRS) collec...
改善4-Mask工艺Al腐蚀的方法
有源层 腐蚀
2014/3/20
为了减少制造工艺的流程,改进的4-Mask工艺被广泛应用。但这个工艺仍存在一些问题,如果有源层刻蚀和第二次源漏数据线刻蚀之间间隔时间较长(≥5.9 h),则有源层刻蚀所用气体Cl2形成的活化分子会对沟道内Al造成腐蚀。除了缩短上述间隔时间的方法外,本文应用有源层刻蚀后处理加入SF6/O2的方法,很好地阻止了对Al的腐蚀,对改进后4-Mask工艺的进一步应用具有非常重要的意义。
RESEARCH ON THE IMPROVED IMAGE DODGING ALGORITHM BASED ON MASK TECHNIQUE
Remote sensing images dodging Mask image quality assessment
2014/4/28
The remote sensing image dodging algorithm based on Mask technique is a good method for removing the uneven lightness within a single image. However, there are some problems with this algorithm, such ...
MAN-MADE AREA CHANGE DETECTION BASED ON MASK WITH HJ IMAGE AND TM IMAGE
HJ Image TM Image Change Detection Man-made Area
2014/5/8
Change detection of man-made area with HJ image and TM image is difficult mostly due to HJ image having less bands and lower
spectral response. In this paper, after the image analysis of HJ image an...
Blur-mask approach (BMA) was developed to simulate the light distribution of locally controlled LED backlight, providing much lower computational complexity which is less than1% of that of conventiona...
Mask films for thermally induced superresolution readout in rewritable phase-change optical disks
Gerasable phase change mask films thermally induced superresolution readout cyclability tellurium
2011/11/29
Tellurium was studied as a mask film in a thermally induced superresoulution rewritable optical disk for detecting below-diffraction-limit marks.Mark trains of 0.15 could be retrieved with 9dB in carr...
Time-Resolved Error Vector Magnitude for Transmitter Mask Testing in Coherent Optical Transmission Systems
Time-Resolved Optical Transmission Systems Mask Testing
2015/5/15
We propose a novel transition-sensitive measurement approach for coherent optical systems. The time-resolved error vector magnitude (EVM), combined with mask testing, is a powerful tool for pass/fail ...
Real-time mask-division technique based on DMD digital lithography
digital lithography technique mask-division technique DMD-based lithography edge
2011/5/6
Digital lithography technique is a promising tool for the fabrication of binary optical element. In
this paper, we present the mask-division technique to improve the lithography quality. A piece of
...
Grating Writing Through the Polyimide Fibre Coating with Femtosecond IR Radiation and a Phase Mask
Grating Writing Through Polyimide Fibre Coating Femtosecond IR Radiation
2015/8/4
Fibre Bragg gratings were written through the polyimide coating of commercial high NA fibres with ultrafast 800 nm radiation. Index modulations =2X10 -4 remain after 140 hours at 360°C.